Designed with focus on high performance at an affordable price, the MLA100 is the perfect lithography solution for many R&D applications. The optical system is designed to write structures down to 1 μm at a speed of 50 mm²/min directly into photoresist, without the need for a photomask. The elimination of photomasks from the lithographic process will increase the flexibility and significantly shorten the prototyping or manufacturing cycle. The MLA100 is controlled by an exposure wizard (GUI), which guides the operator through the complete procedure: Load the substrate, select the design and start the exposure. With a footprint of 60x75cm² the MLA100 was designed to fit even into the smallest R&D laboratories, and requires only power and compressed air for operation.

Applications for the MLA100 include Life Science, MEMS, Micro-Optics, Semiconductor, Sensors, Actuators, MOEMS, Material Research, Nano-Tubes, Graphene, and any other application that requires microstructures.