VPG⁺200和400非常适合生产掩模板以及对应i-line光阻，例如SU-8和IP3600的应用，超高速曝光引擎和自动对准能力共同为系统提供卓越的分辨率、优秀的影像质量和快速的吞吐量。

VPG⁺200和400系列对于较小曝光区域的典型应用，包括微机电系统(MEMS)、先进封装、3D集成、LED生产和化合物半导体等领域。

The successful VPG (Volume Pattern Generator) family – with an installation base of more than 50 worldwide – has evolved once more. Since its inception, the VPG product line has continuously been improved further as technology advanced. The newly integrated high-speed spatial light modulator now represents a quantum leap in performance – a development that is reflected in an upgraded product name: VPG⁺.

The Small Area VPG⁺: The best of both worlds
Our VPG⁺ systems are available in versions for small and large area exposures. All of them share the same powerful technology. The VPG⁺ 200 and VPG⁺ 400 are Heidelberg Instruments’ most advanced small and midsize high-speed exposure systems. While their principle of operation is based on the technology employed by the company’s large area VPG platforms, they also benefit from our vast experience in small area lithography.

Our Multi-Purpose Volume Pattern Generators are perfectly suited for the production of standard photomasks as well as for i-line resist applications. An ultra-high-speed exposure engine and automated alignment capability both contribute to systems that excel through high resolution, outstanding image quality, and fast throughput.

Our VPG⁺ 200 and 400 systems present a perfect solution for applications that use i-line resists such as SU-8 and IP 3600, for example for rapid prototyping applications in microfluidics. In combination with their high speed and resolution, the VPG⁺ 200 and 400 therefore provide an excellent alternative to an i-line stepper.

Typical applications for the smaller exposure area members of the VPG⁺ family include such demanding fields as MEMS, advanced packaging, 3D integration, LED production, and compound semiconductors.

我们的大尺寸VPG⁺系统非常适合用于先进封装、半导体、显示器、彩色滤光片、LED和触控面板等应用的掩膜版制作。系统支持所有工业数据格式，并提供Mura优化功能，确保优秀的CD均匀性和分辨率，封闭环境室符合最严格的高级掩膜版技术使用的要求。由于速度快、系统价格具有吸引力且运行成本低，大尺寸VPG⁺系列是大尺寸掩膜版应用中最具生产力的解决方案。

VPG⁺1400是我们最大的系统，尤其适用于显示器领域的应用，如TFT数组、彩色滤光片和ITO，并具有特别强大的环境室、分差干涉仪，分辨率高达1.2nm，以及先进的Mura校正能力。

Our Large Area VPG⁺ systems are perfectly equipped for applications such as photomask fabrication for advanced packaging, semiconductors, displays, color filters, LEDs, and touch panel applications. The systems support all industrial data formats and offer Mura optimization functions ensuring excellent CD uniformity and resolution. The closed-loop environmental chambers comply with the most stringent requirements for use in advanced photomask technology. Because of their speed, attractive system price, and low running costs, the Large Area VPG⁺ series represents the most productive solution for large area photomask applications.

The VPG⁺ 1400 is our largest system and particularly aimed at applications in the display industry: FPD applications like TFT-arrays and color filters, and ITO. The VPG⁺ 1400 features a particularly powerful environmental chamber, a differential interferometer with a resolution down to 1.2 nm, and advanced Mura correction capabilities.

VPG 300 DI 是一款专为在 i-line 光刻胶中进行高分辨率的微结构而设计的雷射直写图型发生器源自于光罩制造工具，具备所有先进的 VPG 系统组件，能够实现最高精度和准确度，其最大写入区域可覆盖 300 mm的晶圆。

VPG 300 DI 主要应用领域是学术和工业研究与开发，尤其对于需要高灵活性和小于 2 µm微结构的应用。适用于各种应用的需求，包括产品原型设计、MEMS、与其他工具的混合和匹配，以及具有无缝拼接写入效果。

VPG 300 DI 的性能与传统的光罩 i-line 步进式曝光机相当，同时提供无光罩激光直写技术的优势。

The VPG 300 DI is a Volume Pattern Generator specially designed for direct writing high-resolution microstructures in i-line resists. Derived from the mask making tool, it features all advanced VPG system components to be able to write with the highest precision and accuracy. The maximum write area covers a 300 mm wafer.

The target usage of the VPG 300 DI system is primarily in academic and industrial research and development, where high flexibility and features smaller than 2 µm are required. This system caters to the needs of various applications, including product prototyping, MEMS, mix and match with other tools, and writing of structures with quasi-stitching-less unlimited die sizes. The VPG 300 DI performance is comparable to a mask-based i-line stepper that is traditionally used for these applications, while providing the advantages of a maskless patterning technology.