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| 日本柯尼卡美能达高解析玻璃底片 Konica Minolta High Precision Photo Plate |
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| 高解析底版 - High Resolution Type HY2 |
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适用范围 (Applications): |
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适用于各种不同激光类型的光源产品，例如：YAG, Ar, He-Cd。 |
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也适用于接触式负片玻璃干版制程。 |
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光谱感度 (Spectra sensitivity): |
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制程条件 (Processing conditions): |
制程步骤
(Processing) |
搭配药水
(Chemical used) |
制程温度
(Temp.) |
制程时间
(Time) |
显影
(Development) |
显影液 (Developer)
CDH-100
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20℃ |
显影时间5分钟配合不断摇晃槽体
(5 minutes with continuous agitation) |
中止反应
(Stop bath) |
醋酸 (Acetic acid)
(3%) |
18~21℃ |
10~30秒
(10 to 30 seconds)
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定影
(Fix) |
定影液 (Fixer).
CFL-881
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18~21℃ |
显影时间2分钟配合不断摇晃槽体
(2 minutes with continuous agitation) |
水洗
(Wash) |
流动水
(Flowing water) |
18~21℃ |
10分鐘以上
(10 minutes
or more) |
风干
(Drying) |
20 to 50℃ 干燥空气
(Clean air 20 to 50℃) |
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Designated safe light : Please ask for details |
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关键词:
掩模板 (Photo mask) 铬板 (Chrome mask) 干版 (Emulsion mask)图形发生器 (Pattern generator) 无掩膜光刻 (maskless lithography) 激光光刻 (Laser plotter) 制板 |
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