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公司介绍德国海德堡光罩绘图机玻璃干版.材料全自动制程机/冲片机
 
日本柯尼卡美能达高解析玻璃底片 Konica Minolta High Precision Photo Plate
 
()的材质:
HE1
 
 
Matte Type
Protection Layer Type
Matte&Protection Layer Type
 
  Available with 4types of layers;
Standard clear type, Matte type, Protection layer type, and Matte & Protection Layer type.
 
  特色 (Features):  
 

Matte Type:

  Shorter vacuum contact time with the same high quality image of clear type. No image deterioration with less light scattering by employing spherical polymer with uniformed-size(average of 2.8μm) particles as matte agent.
 
Matte Type
   

Protection Layer Type:

  Improved contact resistance with protection layer on the emulsion with the same high quality image. No density deterioration by solvent cleaning woth improved solvent resistance. No image deterioration nor delay of development with only 1micrion meter thick of protection layer with uniformed thin coating technology.
 
Protection Layer Type
   
Matte & Protection Layer Type:
  Achieved both Features of Matte Type and Protection Layer type. Keeping high quality image as clear type, shorter vacuum contact time, improved contact resistance, and improved solvent resistance.
 
Matte & Protection Layer Type
   
尺寸/厚度 (Size, Thickness)
厚度
(Thinkness)
尺寸
(Size)
Inch
mm
Inch
mm
0.06
1.6 (1.6 ± 0.1)
4 X 4
101.6 X 101.6 (+0/-0.8)
0.09
2.3 (2.3 ± 0.1)
17 X 17
431.8 X 431.8 (+0.8/-0.4)
0.11
3.0 (2.8 ± 0.1)
14 X 14
355.6 X 355.6 (+0.8/-0.4)
0.19
5.0 (4.9 ± 0.1)
14 X 14
355.6 X 355.6 (±0.6)
20 X 24
508.0 X 609.6 (±0.6)
24 X 32
609.6 X 812.8 (±0.6)
28 X 32
711.2 X 812.8 (±0.6)
32 X 43
812.8 X 1092.2 (±0.6)
32 X 54.3
812.8 X 1379.2 (±0.6)
36 X 43
914.4 X 1092.2 (±0.6)
36 X 58
914.4 X 1473.2 (±0.6)
   
Chemicals
  显影液 (Developer)
Emulsion Type

显影液
Developer

Making volume
(Dilution ratio Solution : Water)

HE1
DE-200
30 L (1:2)
CE1
RL1
HY2
CDH-100
50 L (1:4)
RL1
CDM-721
40 L (1:3)
AL2
CDL-271K
30 L
(Solution A:Solution B:Water = 1:1:4)
PL
   
  定影液 (Fixer)
Emulsion Type
定影液
Fixer

Making volume
(Dilution ratio Solution : Water)

HE1
CFL-881
30 L (2:3)
CE1
RL1
HY2
AL2
PL
 
  关键词:
掩模板 (Photo mask) 铬板 (Chrome mask) 干版 (Emulsion mask)图形发生器 (Pattern generator) 无掩膜光刻 (maskless lithography) 激光光刻 (Laser plotter) 制板