MPO100

双光子聚合技术

MULTI-USER TOOL FOR 3D LITHOGRAPHY AND 3D MICROPRINTING
实现3D光刻和3D微型打印的多用途工具

MLA无掩膜光刻机激光直写

MPO 100 是一种双光子聚合 (TPP) 多用途工具,可用于光学、光子学、机械和生医工程中的微型结构技术。 MPO 100的3D模块打印平台可按照需求提供高精度的3D光刻和3D打印高度,并可在单个工艺步骤中实现复杂的微型结构。

MPO 100 拥有一个强大的飞秒雷射系统,工作波长为522nm,因此能够高效、高速的处理许多商用的聚合物材料,其中之一是已获得业界验证的一种无机-有机混和聚合物,称为ORMOCER®,这类材料具有独特的光学、机械和化学特性。此外,由于许多光阻在522522 nm TPP波长下表现出高灵敏度,因此MPO 100是研发新材料系统的理想工具。

1 – 10 – 100 – 1000

应用特定的写入模块可在 3D 光刻和 3D 微打印之间快速且易于切换,可以制造高度超过1cm的宏观结构,以及表面质量优异且粗糙度达到10nm以下的微结构;可实现的最小特征尺寸可达 100 nm,可达成的扫描速度超过1000 mm/s,为定制的3D奈米、微米和宏观加工过程提供用户达到全面的效益。

The MPO 100 is a Two-Photon Polymerization (TPP) Multi-User Tool for 3D Lithography and 3D Microprinting of microstructures with applications in Optics, Photonics, Mechanics and Biomedical Engineering. The modular 3D printing platform MPO 100 offers high precision on demand for 3D Lithography as well as high print volume for 3D Microprinting and enables production of complex functional microstructures with high throughput in a single process step.

The MPO 100 includes a powerful femtosecond laser system operating at a wavelength of 522 nm thereby enabling efficient and high-speed processing of many commercially available polymer systems. Among those is the industry-proven class of inorganic-organic hybrid polymers known as ORMOCER®. This class of materials provides unique optical, mechanical and chemical properties. In addition, as many photoresists exhibit high sensitivity at the 522 nm TPP wavelength the MPO 100 is an ideal tool for R&D to develop new material systems.

1 – 10 – 100 – 1000

Application-specific write modes enable fast and easy switching between 3D Lithography and 3D Microprinting. Macro structures with a height of over 1 cm can be fabricated as well as micro structures with superior surface quality exhibiting a roughness of down to 10nm. The achievable minimum feature size of down to 100 nm and the accessible scan speed of over 1000mm/s provide full user benefit for tailored 3D nano-, micro- and macro fabrication processes.

MLA无掩膜光刻机重点功能

Performance

Print height (max.) ≥ 1 cm Roughness (min.) ≤ 10 nm Minimum feature size ≤ 100 nm (lateral) and ≤ 300 nm (vertical) Scan speed (max.) 10 m/s divided by magnification (e.g. 1000 mm/s for 10x) Materials (additive or subtractive) ORMOCER®s, SU-8, customer-specific resins, AZ-series, ma-P 1200, metal layers (e.g. Ag, Au, Cr, ...) Structuring modes:Scan-and-Step with advanced stitching algorithms Stage only for stitching-free fabrication Synchronized Infinite Field-of-View (IFoV) for stitching-free fabrication

MLA无掩膜激光直写应用功能

System features

Laser:λ = (522 ± 3) nm    τpulse ≤ 250 fs    frep = (63 ± 0.6) MHz Pmean ≥ 600 mW    Epulse > 10 nJ Laser power at focusing optics (max.) ≥ 200 mW Focusing optics Numerical aperture: 0.2 (air) to 1.4 (immersion) Magnification: 5x to 100x Field-of-View (FoV): up to 2 mm Print area:100 mm x 100 mm Autofocus:Optical detection of interfaces, reproducibility down to ± 50 nm Substrate:Size: up to 6-inch (4-inch process area), Thickness: up to 4 cm Software:LithoSoft3D (code generation software)    LithoStream (system control software) Temperature controlled flow box:Control down to ± 0.1°, ISO Class 4 cleanroom environment

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