NanoFrazor Scholar

NanoFrazor Explore

科研型热探针扫描光刻机
热探针扫描光刻机

THERMAL SCANNING PROBE LITHOGRAPHY TOOL
经济实惠的系统,适合奈米加工的学术研究

THERMAL SCANNING PROBE LITHOGRAPHY TOOL
同时具备激光直写和热探针光刻功能

NanoFrazor® Scholar特别适合纳米加工研究的学术单位,用于在1D/2D 材料,例如量子点和纳米数组上制作量子器件的纳米结构,其独特的功能使能够应用任何新材料。例如,灰度光子学设备、纳米流道结构或用于细胞生长的仿生基质等进阶应用;通过加热探针对材料进行局部改性,例如化学反应和物理相变。

原位成像具有两个独特的功能,无标记覆写(markerless overlay), 及在写入过程中与目标图形随时校正,立即调整参数的閉環光刻(closed-loop);可以使实现复杂的2.5D(灰度)及垂直精度2nm,对加热的纳米级针端进行快速精确的控制,实现了其他设备无法突破的创新。

此系统技术的研发是从IBM research Zürich开始,经过20多年深入研究的成果,到目前由海德堡Heidelberg Instruments Nano进行。NanoFrazor® 硬件和软件不断进步,以扩大设备功能和效能及其应用范围。我们专业的团队继续为不同的应用开发和优化图案转移工艺,我们会不断进步实现最完美的独家技术,用以支持我们的客户。

The NanoFrazor® Scholar is particularly suitable for academic research groups requiring an affordable system for nanofabrication. NanoFrazor® Scholar is used for nanopatterning of quantum devices on 1D/2D materials such as quantum dots, Dolan bridges and Josephson junctions, and nanoscale arrays. Its unique capabilities enable new devices in new materials. For example, it is used for advanced applications such as grayscale photonics devices, nanofluidics structures or biomimetic substrates for cell growth; local modification of materials by heat, e.g. chemical reactions and physical phase changes.

In-situ imaging enables two unique features: markerless overlay, and comparison of the written and target patterns during writing so the parameters can be immediately adjusted. This approach, called closed-loop lithography, results in sub-2 nm vertical precision for 2.5D (grayscale) shapes of any complexity. Fast and precise control of a heated nanoscale tip enables innovation not otherwise feasible.

The technology behind the system is the result of more than 20 years of intensive research and development (R&D) that started at IBM Research Zürich and now takes place at Heidelberg Instruments Nano. The NanoFrazor® hardware and software are constantly advancing to extend the capabilities and performance of the tool and its range of applications. Our dedicated team of experts continues to develop and optimize the pattern transfer processes for different applications. We compile this know-how in a growing library of best practices and protocols to support our customers.

NanoFrazor® Explore是最经济实惠热探针光刻工具,用于1D/2D材料,例如量子点、量子器件的纳米结构,其独特的功能使能够应用任何新材料。例如,灰度光子学设备、纳米流道结构或用于细胞生长的仿生基质等进阶应用;通过加热探针对材料进行局部改性,例如化学反应和物理相变。

使用激光直写模块,可以在每个步骤中快速写入同一胶层做出微纳米结构。原位成像实现两个独特的功能:无标记覆写(markerless overlay), 及在写入过程中与目标图形随时校正,立即调整参数的閉環光刻(closed-loop);可以使任何复杂的2.5D(灰度)对加热的纳米级针端进行快速精确的控制,实现了其他设备无法突破的创新。

此系统技术的研发是从IBM research Zürich开始,经过20多年深入研究的成果,到目前由海德堡Heidelberg Instruments Nano进行。 NanoFrazor®件和软件不断进步,以扩大设备功能和效能及其应用范围。我们专业的团队继续为不同的应用开发和优化图案转移工艺,我们会不断进步实现最完美的独家技术,用以支持我们的客户。

NanoFrazor® Explore is the first commercial thermal scanning probe lithography tool. NanoFrazor® Explore is used for nanopatterning of quantum devices on 1D/2D materials, such as quantum dots, Dolan bridges and Josephson junctions, and nanoscale arrays. Its unique capabilities enable new devices in new materials. For example, it is used for advanced applications such as grayscale photonics devices, nanofluidics structures or biomimetic substrates for cell growth; local modification of materials by heat, e.g. chemical reactions and physical phase changes.

With the direct laser sublimation module, nano- and microstructures are now seamlessly and quickly written into the same resist layer in a single fabrication step. In-situ imaging enables two unique features: markerless overlay, and comparison of the written and target patterns during writing, so the parameters can be immediately adjusted. This approach, called closed-loop lithography, results in sub-2 nm vertical precision for 2.5D (grayscale) shapes of any complexity. Fast and precise control of a heated nanoscale tip enables innovation not otherwise feasible.

The technology behind the system is the result of more than 20 years of intensive research and development (R&D) that started at IBM Research Zürich, and now happens at Heidelberg Instruments Nano. The NanoFrazor® hardware and software are constantly advancing to extend the capabilities and performance of the tool and its range of applications. Our dedicated team of experts keeps developing and optimizing the pattern transfer processes for different applications. We compile this know-how in a growing collection of best practices and protocols to support our customers.

KEY FEATURES

Substrate size: 1 x 1 mm² to 50 x 50 mm² (100 x 100 mm² possible) Minimum Structure size: down to 20nm Write speed (typical scan speed): 0.5 [mm/s] 10 nm lateral resolution 1 nm vertical resolution (3D grayscale) Thermal Scanning Probe Lithography Non-invasive Lithography Markerless Overlay and Stitching (< 25 nm accuracy) vibration isolation included dedicated glovebox available

Substrate size: 1 x 1 mm² to 100 x 100 mm² ( 150 x 150 mm² possible) Minimum Structure size: 15nm(Probe)/600nm(Laser) Write speed (typical scan speed): 1[mm/s]( Probe)/5[mm/s](Laser) 10 nm lateral resolution 1 nm vertical resolution (3D grayscale) Thermal Scanning Probe Lithography DLS integrated laser writer module Non-invasive Lithography Markerless Overlay and Stitching (< 25 nm accuracy)

Application

2D materials Quantum devices Nanowire devices Nanofluidics Surface functionalizations

2D materials Quantum devices Nanowire devices Nanofluidics Surface functionalizations